Various optical filter coatings are arranged on a common substrate by a sophisticated photolithography technique, or by using vapor shadow masks. The monolithic filter-arrays are produced with no expense for mounting or assembling. Plasma-assisted deposition guarantees high performance and long-term stable filter characteristics.
Wavelength range
250 – 2000 nm
Quantity of filter types per array
1 – 10
Passband transmittance
> 90%
Blocking
OD2 – OD4
Maximum filter dimension
200 mm
Minimum filter dimension
20 µm
Transition range between filters
< 20 µm
Position accuracy
< 2 µm
Surface Imperfections
< 100 µm
Temperature range
– 50… 150°C
Humidity range
0 – 99%